The MULTISEM design concept is based on an open parallel architecture consisting of a central supervisor control unit, and a network of analytical substations

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Interferometry is a powerful technique that can be used for endpoint detection of planar layer and trench etching, or deposition

PVD, PECVD, e-beam, thermal, evaporation, solar PV, photovoltaic, production equipment, sputtering

The CMI is a complex of clean rooms and processing equipment for the training and scientific experimentation devoted to the users of microtechnologies.

Semefab Sensor and Silicon Solutions. Process development, induction and fabrication of Silicon based Foundry services and Sensor products. MEMS.

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